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1.MEME版图设计与制备-掩膜版2
1.MEME版图设计与制备-掩膜版1

MEMS Layout Design and Preparation

We can design and produce various sizes of mask plates, including 3 ", 4", 5 ", 6", 7 ", 9" contact exposure mask plate processing, customized processing of irregular mask plates, etc. The resolution of the contact mask plate can reach 1um, with an accuracy of ± 0.3um.